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Vacuum applications in the semiconductor industry

Jiangsu Quantianxia Intelligent Equipment Co., Ltd. is a high-tech company with R&D and production of high-end special pumps and pump application systems as its main business. We mainly serve the fields of pharmaceutical and chemical industry, semiconductor, new energy battery, photovoltaic coating, etc. Our company specializes in the production of dry screw vacuum pump, rotary vane vacuum pump, water ring vacuum pump, Roots vacuum pump and other vacuum equipment, and can also customize personalized Roots vacuum units and vacuum system application solutions with different performance requirements for you.

We have professional technology and unremitting efforts to provide you with perfect vacuum engineering design, consulting, maintenance, repair, modification and other technical support and services, my company will bring you the best quality products and the fastest service. If you want to know more about vacuum pumps or want to buy such products, welcome to inquire! Contact: 0755-28997459-8042/19168500859 (wechat number)

●In the field of semiconductor applications involved are: electronic acceleration, photoelectric devices, electronic materials, ray tubes, crystal vibration, relays, lasers, ion implantation equipment, ion etching machine, chemical vapor deposition equipment, physical vapor deposition equipment, molecular beam epitaxy equipment, integrated circuit packaging, other semiconductor application equipment, such as vacuum pumps.

●According to the process requirements, the structure and vacuum requirements of the vacuum pump are different, common: evaporation, sputtering, PECVD, vacuum dry etching, vacuum adsorption, test equipment, automatic vacuum cleaning and other processes

  • 物理气相沉积

    该工序主要分为三类真空蒸发镀膜、真空溅射镀膜和真空离子镀膜,通过物理方法将材料源的基体表面沉积形成特殊功能的薄膜。

    适用产品:罗茨真空机组,干式螺杆真空泵,旋片式真空泵,分子泵等泵浦。

  • 离子注入

    该工序是一种材料表面改性技术,把某种元素的原子电离成离子,最后停留在材料中,使其发生一系列物理和化学的相互作用,从而获得优异的表面性能。

    适用产品:罗茨真空机组,干式螺杆真空泵,旋片式真空泵,分子泵等泵浦。

  • 晶圆清洗

    晶圆单片清洗工艺流程是IC制造中极其重要的工艺环节之一,它的主要作用是清除晶圆上的杂质和附着物,保证晶圆的纯净度和良率。

    适用产品:罗茨真空机组,干式螺杆真空泵,旋片式真空泵,分子泵等泵浦。

  • 化学气相沉积

    该工序主要是利用含有薄膜元素的一种或几种气相化合物或单质、在衬底表面上进行化学反应生成薄膜的方法。

    适用产品:罗茨真空机组,干式螺杆真空泵,旋片式真空泵,涡旋泵,分子泵等泵浦。

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